NEN (Netherlands Standardization Institute) has published the draft of EN 149:2026 for public comment. The draft sets minimum requirements for particle filtering half masks (FFP) used in occupational settings, covering laboratory and practical performance testing.
The revised test methods are expected to affect certification pathways for FFP1, FFP2 and FFP3 devices. Stakeholders are invited to submit their comments during the public consultation period.
Source: NEN — nen.nl (EN 149:2026 draft)